- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/56 - Organic absorbers, e.g. photo-resists
Patent holdings for IPC class G03F 1/56
Total number of patents in this class: 29
10-year publication summary
4
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1
|
0
|
3
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2
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2
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2
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2
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2
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1
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2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
6 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
2 |
Boe Technology Group Co., Ltd. | 35384 |
2 |
Materion Corporation | 293 |
2 |
Samsung Electronics Co., Ltd. | 131630 |
1 |
LG Chem, Ltd. | 17205 |
1 |
Merck Patent GmbH | 5909 |
1 |
Micron Technology, Inc. | 24960 |
1 |
Infineon Technologies AG | 8189 |
1 |
Hoya Corporation | 2822 |
1 |
Commissariat à l'énergie atomique et aux energies alternatives | 10525 |
1 |
ASM IP Holding B.V. | 1715 |
1 |
Beijing BOE Optoelectronics Technology Co., Ltd. | 3779 |
1 |
Hefei BOE Optoelectronics Technology Co., Ltd. | 1346 |
1 |
IMEC VZW | 1410 |
1 |
Lintec Corporation | 1915 |
1 |
Nanya Technology Corporation | 2000 |
1 |
Rohm and Haas Electronic Materials LLC | 637 |
1 |
HKC Corporation Limited | 2951 |
1 |
Chongqing HKC Optoelectronics Technology Co., ltd. | 1330 |
1 |
Other owners | 1 |